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FORS2 QC
Trending & QC1
   MOS wavel. cal
Pipeline
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QC links:
FORS2: MOS Wavelength solution and resolution
Wavelength Calibration | Flatfield Calibration

 
HC PLOTS
central wavelength
average resolution
no. of wavelengths used for resolution
central wavelength vs. focus temp.
QC1 database (advanced users): browse | plot

The determination of the dispersion relation for MOS data is done as follows: The recipe fors_calib identifies reference lines on MOS arc lamp exposures, and traces the spectral edges on the associated flat field exposures. With this information the spectral extraction mask to be applied in the scientific data reduction is determined. From the input flat field exposures a normalised flat field frame is also derived. The input arc lamp and flat field exposures are assumed to be obtained quasi-simultaneously, so that they would be described by exactly the same optical distortions. Wavelength calibration is performed row by row and produces a 2-D rebinned science frame. This has the effect of removing the instrumental line curvature and allows the user to extract her/his spectra and have them wavelength calibrated without any additional operation on the frame itself.

The global list of lines currently used by FORS pipeline can be found here.

Due to the high number of possible grism/slit combinations, the Pipeline uses a polynomial with a maximum degree of 5 (for 150I without filters) in the dispersion direction, while a 2nd order polynomial is adopted in the spatial direction. The current version of the pipeline is known to have some problems for slitlets with extreme offsets, that result in arc spectra with few lines.


Wavelength Calibration
Wavelength Calibration | Flatfield Calibration

QC1_parameters

FITS key QC1 database: table, name definition class* HC_plot** more docu
QC.MOS.CENTRAL.WAVELENGTH fors2_mos_wave..central_wlen computed wavelength at the center of slitlet #10 (center of field) HC [docuSys coming]
QC.MOS.RESOLUTION fors2_mos_wave..central_resol mean spectral resolution averaged over whole CCD HC [docuSys coming]
QC.MOS.RESOLUTION.NLINES fors2_mos_wave..nwave independent number of wavelengths used for resolution (since 2006-10-01) HC [docuSys coming]
INS.FOCU.TEMP fors2_mos_wave..ins_focus_temp focus temperature (C degrees) HC [docuSys coming]
*Class: KPI - instrument performance; HC - instrument health; CAL - calibration quality; ENG - engineering parameter
**There might be more than one.

Trending

The wavelength calibration related parameters are monitored for both MIT and EEV detectors.

Scoring&thresholds Wavelength Calibration

The MOS average resolution and number of wavelengths used to determine resultion are tightly scored with constant thresholds. The requirement is stability on the calibration timescale.

History

No major events

Algorithm Wavelength Calibration

Central wavelength is a wavelength at the center of field if all slitlets are aligned there. Otherwise this parameter is not calculated. The central wavelength can change slightly due to earthquakes or dismounting of the instrument.

Central resolution is the mean resolution averaged over all spectral lines detected on the complete CCD. The mean rms of central resolution is the mean RMS of the resolution per line averaged over the whole wavelength range (and not just for the center of the CCD).

Number of independent identified arc lines is a number of independent arc lines that were identified and then used to calculate the above listed parameters.


Flatfield Calibration
Wavelength Calibration | Flatfield Calibration

QC1_parameters

FITS key QC1 database: table, name definition class* HC_plot** more docu
[Calculated by QC procedure] fors2_mos_wave..n_saturated number of saturated pixels in the flat [docuSys coming]
*Class: KPI - instrument performance; HC - instrument health; CAL - calibration quality; ENG - engineering parameter
**There might be more than one.

Trending

No trending

Scoring&thresholds Flatfield Calibration

No scoring

History

After the mid 2012 intervention to increase the throughput of the External Calibration Unit (ECU), the ECU lamps were appearing too bright, causing saturation of flat frames taken particularly with the 150I, 300V and 300I grisms. Eventually, in the summer of 2013 the exposure times were adjusted and situation stabilized. From June 1, 2013 until November 15, 2013 quality of the spectroscopic calibration files cannot be guaranteed.

Algorithm Flatfield Calibration

This parameter corresponds to the number of pixel with more than 65000 ADU in the first raw flat frame. The saturation level is 65535 ADU. The counts of the first 10 pixel rows (at the bottom) and the last 10 pixel rows (at the top) are ignored. Before 2012-10-10, the definition of this QC1 parameter was based on the counts of the pipeline processed master spectroscopic flats.


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